Katrina Mikhaylich
24Patents
9h-index
11Co-inventors
68Inventor score
Filing activity: Oct 30, 1998 → Sep 22, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6361414B1 | Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process | Performing Operations; Transporting | 39 | Expired |
| US6435952B1 | Apparatus and method for qualifying a chemical mechanical planarization process | Performing Operations; Transporting | 34 | Expired |
| US6431959B1 | System and method of defect optimization for chemical mechanical planarization of polysilicon | Electricity | 31 | Expired |
| US6622335B1 | Drip manifold for uniform chemical delivery | Emerging Cross-Sectional Technologies | 28 | Expired |
| US6616516B1 | Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates | Electricity | 18 | Expired |
| US7231682B1 | Method and apparatus for simultaneously cleaning the front side and back side of a wafer | Electricity | 11 | Expired |
| US6471566B1 | Sacrificial retaining ring CMP system and methods for implementing the same | Performing Operations; Transporting | 10 | Expired |
| US6858091B2 | Method for controlling galvanic corrosion effects on a single-wafer cleaning system | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6375540B1 | End-point detection system for chemical mechanical posing applications | Performing Operations; Transporting | 9 | Expired |
| US6352595B1 | Method and system for cleaning a chemical mechanical polishing pad | Performing Operations; Transporting | 8 | Expired |
| US6537381B1 | Method for cleaning and treating a semiconductor wafer after chemical mechanical polishing | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6845778B2 | In-situ local heating using megasonic transducer resonator | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6994611B2 | Method and system for cleaning a chemical mechanical polishing pad | Performing Operations; Transporting | 6 | Expired |
| US6711775B2 | System for cleaning a semiconductor wafer | Electricity | 5 | Expired |
| US6800020B1 | Web-style pad conditioning system and methods for implementing the same | Performing Operations; Transporting | 5 | Expired |
| US7029369B2 | End-point detection apparatus | Performing Operations; Transporting | 4 | Expired |
| US6170110A | Apparatus for HF-HF cleaning | Emerging Cross-Sectional Technologies | 4 | Expired |
| US6093254A | Method of HF-HF Cleaning | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7270597B2 | Method and system for chemical mechanical polishing pad cleaning | Performing Operations; Transporting | 3 | Expired |
| US6726530B2 | End-point detection system for chemical mechanical polishing applications | Performing Operations; Transporting | 3 | Expired |
| US8051863B2 | Methods of and apparatus for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscus | Emerging Cross-Sectional Technologies | 1 | Active |
| US6679763B2 | Apparatus and method for qualifying a chemical mechanical planarization process | Performing Operations; Transporting | 1 | Expired |
| US6827793B2 | Drip manifold for uniform chemical delivery | Emerging Cross-Sectional Technologies | 0 | Expired |
| US8287656B2 | Methods for correlating gap value to meniscus stability in processing of a wafer surface by a recipe-controlled meniscus | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.