Mike Ravkin
51Patents
11h-index
41Co-inventors
74Inventor score
Filing activity: Jun 10, 1999 → May 31, 2016
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6488040B1 | Capillary proximity heads for single wafer cleaning and drying | Emerging Cross-Sectional Technologies | 117 | Expired |
| US6616772B2 | Methods for wafer proximity cleaning and drying | Emerging Cross-Sectional Technologies | 60 | Expired |
| US6594847B1 | Single wafer residue, thin film removal and clean | Emerging Cross-Sectional Technologies | 52 | Expired |
| US6361414B1 | Apparatus and method for conditioning a fixed abrasive polishing pad in a chemical mechanical planarization process | Performing Operations; Transporting | 39 | Expired |
| US7069937B2 | Vertical proximity processor | Emerging Cross-Sectional Technologies | 36 | Expired |
| US7234477B2 | Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces | Emerging Cross-Sectional Technologies | 35 | Expired |
| US6435952B1 | Apparatus and method for qualifying a chemical mechanical planarization process | Performing Operations; Transporting | 34 | Expired |
| US6622335B1 | Drip manifold for uniform chemical delivery | Emerging Cross-Sectional Technologies | 28 | Expired |
| US7153400B2 | Apparatus and method for depositing and planarizing thin films of semiconductor wafers | Electricity | 17 | Expired |
| US6240588A | Wafer scrubbing brush core | Performing Operations; Transporting | 16 | Expired |
| US6543084B2 | Wafer scrubbing brush core | Performing Operations; Transporting | 15 | Expired |
| US6375540B1 | End-point detection system for chemical mechanical posing applications | Performing Operations; Transporting | 9 | Expired |
| US6858091B2 | Method for controlling galvanic corrosion effects on a single-wafer cleaning system | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6537381B1 | Method for cleaning and treating a semiconductor wafer after chemical mechanical polishing | Emerging Cross-Sectional Technologies | 8 | Expired |
| US7632376B1 | Method and apparatus for atomic layer deposition (ALD) in a proximity system | Electricity | 7 | Active |
| US7799141B2 | Method and system for using a two-phases substrate cleaning compound | Electricity | 7 | Active |
| US6711775B2 | System for cleaning a semiconductor wafer | Electricity | 5 | Expired |
| US7350315B2 | Edge wheel dry manifold | Electricity | 5 | Expired |
| US8671959B2 | Method and apparatus for cleaning a substrate using non-newtonian fluids | Emerging Cross-Sectional Technologies | 4 | Active |
| US8043441B2 | Method and apparatus for cleaning a substrate using non-Newtonian fluids | Emerging Cross-Sectional Technologies | 4 | Active |
| US7997288B2 | Single phase proximity head having a controlled meniscus for treating a substrate | Emerging Cross-Sectional Technologies | 4 | Active |
| US7947157B2 | Apparatus and method for depositing and planarizing thin films of semiconductor wafers | Electricity | 4 | Active |
| US7029369B2 | End-point detection apparatus | Performing Operations; Transporting | 4 | Expired |
| US7387689B2 | Methods for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces | Emerging Cross-Sectional Technologies | 3 | Active |
| US6726530B2 | End-point detection system for chemical mechanical polishing applications | Performing Operations; Transporting | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.