Polishing pad with window
US6832950B2 · kind B2 · utility
15Cited by
9References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 28, 2002 |
| Grant date | Dec 21, 2004 |
| Priority date | — |
| Expiry date | Dec 7, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/28
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Polishing pads with a window, systems containing such polishing pads, and processes that use such polishing pads are disclosed. In embodiments, a polishing pad includes a backing layer having an opening, a polishing layer having an opening aligned with the opening in the backing layer, a solid window of a first material in the opening of the polishing layer, a layer of a first adhesive material between the backing layer and the solid window, and a layer of a second adhesive material between the layer of the first adhesive material and the window.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.