Process control based upon a metrology delay
US6834213B1 · kind B1 · utility
9Cited by
3References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2003 |
| Grant date | Dec 21, 2004 |
| Priority date | — |
| Expiry date | Jan 6, 2023 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method and an apparatus for performing process control based upon a metrology delay. A process step is performed upon a first workpiece. Metrology data related to the first workpiece is acquired. A control adjustment based upon the metrology data is determined. A magnitude of the control adjustment is modified based upon a time period. The time period is defined by a first time frame relating to processing the first workpiece and a second time frame relating to acquiring metrology data related to the first workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.