Semiconductor manufacturing device
US6837936B2 · kind B2 · utility
1Cited by
4References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 21, 2002 |
| Grant date | Jan 4, 2005 |
| Priority date | — |
| Expiry date | Aug 10, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70933
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The semiconductor manufacturing device according to the present invention having a mechanical drive part which is moved in a vacuum device while holding a substrate includes at least one discharge port for introducing an inert gas into the vacuum device, and a flow rate control part for controlling the inert gas which is discharged into the vacuum device from the discharge port at a constant flow rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.