Patent · US Expired

Methods of forming patterned reticles

US6842889B2 · kind B2 · utility

2Cited by
11References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 6, 2002
Grant dateJan 11, 2005
Priority date—
Expiry dateApr 9, 2023

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/36
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.