Transfer apparatus and method for semiconductor process and semiconductor processing system
US6845292B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 23, 2002 |
| Grant date | Jan 18, 2005 |
| Priority date | — |
| Expiry date | Jan 23, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/141
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A transfer apparatus (42) for a semiconductor processing system includes a transfer member (44) having a support portion (48) to place a target substrate (W) thereon, and a drive unit (68) for driving the transfer member (44). A reference mark (54) is disposed adjacent to the support portion (48). The target substrate (W) has optically observable first and second portions (84, 86). A storage section (63) stores a normal image that shows a positional correlation between the reference mark (54) and the first and second portions (84, 86), obtained when the target substrate (W) is placed on the support portion (48) at a normal position. An image pick-up device (62A) takes a detection image that shows a positional correlation between the reference mark (54) and the first and second portions (84, 86), when the transfer member (44) transfers the target substrate (W). An information processing unit (62B) obtains a misalignment amount of the target substrate (W) relative to the normal position, based on the normal image and the detection image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.