Variable angle illumination wafer inspection system
US6853446B1 · kind B1 · utility
29Cited by
21References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2000 |
| Grant date | Feb 8, 2005 |
| Priority date | — |
| Expiry date | Feb 21, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/082
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A variable illumination angle inspection system is provided, including a light source providing a light beam and a scanner imparting scanning deflection to the light beam to provide a scanning beam approaching a substrate at a first angle. A deflection element is selectively insertable into an optical path of the scanning beam to deflect the scanning beam so as to cause the scanning beam to approach the substrate at a second angle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.