Solid CO2 cleaning

US6875286B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• John M. Cotte · New Fairfield, US
• Catherine Ivers · Hopewell Junction, US
• Kenneth McCullough · Fishkill, US
• Wayne M. Moreau · Wappingers Falls, US
• Robert J. Purtell · Potsdam, US
• John P. Simons · Cold Spring, US
• William A. Syverson · Colchester, US
• Charles J. Taft · Wappingers Falls, US

Key dates

• Filing date: Dec 16, 2002
• Grant date: Apr 5, 2005
• Expiry date: Dec 16, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S134/902
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A method and apparatus are provided for removing solid and/or liquid residues from electronic components such as semiconductor wafers utilizing liquid or supercritical carbon dioxide which is solidified on the surface of the wafer and then vaporized and removed from the system. In a preferred embodiment the solidification and vaporizing steps are repeated (cycled) before removal of the CO2 from the vessel. The residues are carried away with the vaporized carbon dioxide.