Sputtering target producing few particles
US6875325B2 · kind B2 · utility
7Cited by
1References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 20, 2001 |
| Grant date | Apr 5, 2005 |
| Priority date | — |
| Expiry date | May 8, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/3414
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A sputtering target having a sprayed coating at least on the side face thereof and producing few particles. The deposit produced on the side face of the sputtering target is prevented from separating and flying.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.