Non-intrusive plasma probe
US6894474B2 · kind B2 · utility
17Cited by
9References
42Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 7, 2002 |
| Grant date | May 17, 2005 |
| Priority date | — |
| Expiry date | Sep 3, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/0006
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A probe for measuring plasma properties in a processing chamber, comprises a conductive rod having a front portion and a rear portion. The front portion of the conductive rod comprises a probe surface adapted to be coplanar with an interior wall of the chamber. The probe also includes an insulating sheath circumscribing the conductive rod.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.