Trench transistors and methods for fabricating trench transistors
US6903416B2 · kind B2 · utility
2Cited by
6References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2003 |
| Grant date | Jun 7, 2005 |
| Priority date | — |
| Expiry date | Sep 29, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/62
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A trench transistor has a source zone introduced from a doped spacer into a body region and a channel running vertically along the insulation layer of the trench. A method is taught for fabricating the trench transistor of this type.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.