Plasma device and plasma generating method
US6911617B2 · kind B2 · utility
1Cited by
5References
6Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 18, 2002 |
| Grant date | Jun 28, 2005 |
| Priority date | — |
| Expiry date | Jan 22, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32293
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A desired component of an electromagnetic field in a slot antenna is selectively taken to be supplied into a vessel for generating a plasma. The angle of inclination of slots (36) relative to the circumferential direction of a radiation surface (31) of the slot antenna (30) is decreased as the position of the slots approaches the periphery of the radiation surface 31 from the center O of the radiation surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.