Erosion reduction for EUV laser produced plasma target sources

US6912267B2 · kind B2 · utility

Assignee

• University of Central Florida Research Foundation · US

Inventors

• Rocco A. Orsini · Long Beach, US
• Michael B. Petach · Redondo Beach, US
• Mark E. Michaelian · Torrance, US
• Henry Shields · San Diego, US
• Roy D. McGregor · Corning, US
• Steven W. Fornaca · Torrance, US

Key dates

• Filing date: Nov 6, 2002
• Grant date: Jun 28, 2005
• Expiry date: May 27, 2023

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05G2/0023
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

A laser-plasma EUV radiation source (10) that employs one or more approaches for preventing vaporization of material from a nozzle assembly (40) of the source (10) by electrical discharge from the plasma (30). The first approach includes employing an electrically isolating nozzle end, such as a glass capillary tube (46). The tube (46) extends beyond all of the conductive surfaces of the nozzle assembly (40) by a suitable distance so that the pressure around the closest conducting portion of the nozzle assembly (40) is low enough not to support arcing. A second approach includes providing electrical isolation of the conductive portions of the source (40) from the vacuum chamber wall. A third approach includes applying a bias potential (52) to the nozzle assembly (40) to raise the potential of the nozzle assembly (40) to the potential of the arc.