Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method
US6919574B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 26, 2003 |
| Grant date | Jul 19, 2005 |
| Priority date | — |
| Expiry date | Sep 26, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1504
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam exposure apparatus for exposing a wafer by an electron beam incorporates a circuit structure for conducting a scan test to self-diagnose the electrical connections. The electron beam exposure apparatus includes: an electron beam generating section for generating the electron beam; a plurality of deflectors for deflecting the corresponding electron beams; a deflection control section for outputting a deflection control signal for causing the deflector to deflect the electron beam; and a control signal storage section for storing a value of the deflection control signal output from the deflection control section. The control signal storage section connects the plurality of deflectors in series when conducting the scan test. The control signal storage section and the deflector may be monolithically integrated on a semiconductor substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.