Method of in situ monitoring of supercritical fluid process conditions
US6927393B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 16, 2002 |
| Grant date | Aug 9, 2005 |
| Priority date | — |
| Expiry date | Jul 29, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/3504
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus are provided for in situ monitoring and analyzing of process parameters for semiconductor fabrication processes including cleaning semiconductor wafers utilizing a supercritical fluid or a high pressure liquid such as CO2. The method and apparatus utilize a spectrometer having a reflective mirror proximate the vessel holding the high pressure fluid. NIR radiation transmitted into the vessel through a window and out of the vessel through an opposed window is reflected and detected and measured and the composition of the fluid in the pressure vessel is determined allowing the user to control process parameters based on the measured composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.