Chemical mechanical polishing apparatus with non-conductive elements
US6945845B2 · kind B2 · utility
14Cited by
32References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 18, 2003 |
| Grant date | Sep 20, 2005 |
| Priority date | — |
| Expiry date | Aug 18, 2023 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B49/105
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Conductive elements of a chemical mechanical polishing system may generate undesired eddy currents under the influence of a time-dependent magnetic field used in an eddy current monitoring system. To improve the accuracy of an eddy current monitoring system, elements that may contribute an undesired signal to the sensed eddy current signal may be fabricated from a non-conductive material such as plastic or ceramic. In some implementations, elements may be fabricated from non-magnetic materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.