Lithographic apparatus and device manufacturing method
US6952253B2 · kind B2 · utility
706Cited by
21References
45Claims
0Family size
Assignee
Inventors
- Joeri Lof
- Antonius Theodorus Anna Maria Derksen
- Christiaan Alexander Hoogendam
- Aleksey Yurievich Kolesnychenko
- Erik Roelof Loopstra
- Theodorus Marinus Modderman
- Johannes Catharinus Hubertus Mulkens
- Roelof Aeilko Siebrand Ritsema
- Klaus Simon
- Joannes Theodoor De Smit
- Alexander Straaijer
- Bob Streefkerk
- Helmar Van Santen
Key dates
| Filing date | Nov 12, 2003 |
| Grant date | Oct 4, 2005 |
| Priority date | — |
| Expiry date | Mar 10, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.