Plasma processing apparatus
US6953908B2 · kind B2 · utility
6Cited by
8References
8Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Dec 17, 2003 |
| Grant date | Oct 11, 2005 |
| Priority date | — |
| Expiry date | Dec 17, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B6/806
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing apparatus, comprising: at least, a plasma processing chamber for processing therein an object to be processed; antenna means for guiding microwaves into the plasma processing chamber; and a dielectric member disposed between the antenna means and the plasma processing chamber; wherein a surface of the dielectric member facing the inside of the plasma processing chamber has a projecting shape.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.