Plasma device and plasma generating method
US6967622B2 · kind B2 · utility
1Cited by
5References
9Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 17, 2002 |
| Grant date | Nov 22, 2005 |
| Priority date | — |
| Expiry date | Jan 17, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/46
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma apparatus includes a slot antenna (30) supplying an electromagnetic field to a container in which plasma is generated. Slot antenna (30) has a slot (36) so formed that a radiation plane (31) at a periphery B thereof allows the electromagnetic field to provide radiation smaller per unit area in amount than at an intermediate region C thereof located between a center A and periphery B thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.