Substrate processing apparatus and method for adjusting a substrate transfer position
US6973370B2 · kind B2 · utility
13Cited by
10References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 3, 2004 |
| Grant date | Dec 6, 2005 |
| Priority date | — |
| Expiry date | Jun 3, 2024 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/136
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate processing apparatus can align a substrate with a high precision and a high speed by monitoring a mark formed on a surface of the substrate; operating an amount of misalignment between the center of the substrate and a rotation center of a substrate support member; determining a presence of the misalignment and adjusting the substrate such that the center of the substrate coincides with the rotation center of the substrate support member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.