Material characterization system
US6992286B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 5, 2004 |
| Grant date | Jan 31, 2006 |
| Priority date | — |
| Expiry date | Mar 5, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/28
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An electron beam device is provided with an electron beam diffraction image analysis section for calculation of the lattice distance from the diffraction image taken into by the TV camera for observation of the electron beam diffraction image, the EDX analysis section for acquiring a composition of the material, the data base for retrieval of material characterization, and the material characterization section having the data base retrieval function. The material characterization section characterizes the material by retrieving the retrieval data base, based upon the lattice distance data transferred from the electron beam diffraction image analysis section and the element data transferred from the EDX analysis sectio.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.