Lithographic apparatus with alignment subsystem, device manufacturing method, using alignment, and alignment structure
US6995831B2 · kind B2 · utility
5Cited by
9References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 2, 2005 |
| Grant date | Feb 7, 2006 |
| Priority date | — |
| Expiry date | Mar 2, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7076
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus according to one embodiment of the invention includes an alignment subsystem configured to align the substrate on the substrate table relative to the patterning structure. The alignment structure comprises a non-periodic feature which may be detectable as e.g. a capture position or a check position using a reference grating in the alignment subsystem. The non-periodic feature may cause a phase effect in the detected signal of the alignment subsystem or an amplitude effect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.