Multi-purpose processing chamber with removable chamber liner
US7011039B1 · kind B1 · utility
23Cited by
14References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 7, 2000 |
| Grant date | Mar 14, 2006 |
| Priority date | — |
| Expiry date | Jan 15, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32477
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A multi-purpose chamber that can be configured for a variety of processes, including deposition processes and etch processes, for example, by installing one or more removable chamber liners. The multi-purpose chamber provides uniform plasma confinement around a substrate disposed in the chamber for various processing conditions. The multi-purpose chamber also provides efficient and uniform exhaust of processing gas from the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.