Concentration profile on demand gas delivery system (individual divert delivery system)
US7011710B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2001 |
| Grant date | Mar 14, 2006 |
| Priority date | — |
| Expiry date | Jun 28, 2023 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/45561
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Apparatus and method for delivering processing gas are provided. The apparatus for delivering processing gas from a vaporizer to a processing system comprises: a valve connected between the vaporizer and the processing system, the valve having a valve input connected to a vaporizer output and a first valve output connected to a processing system input and a second valve output connected to a bypass line; and a controller for switching the valve between the first valve output and the second valve output. The apparatus may further comprise: a second valve connected between a carrier gas source, a divert gas source and the vaporizer, the second valve having a first valve input connected to the carrier gas source, a second valve input connected to the divert gas source, and a valve output connected to a vaporizer input.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.