Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems
US7014966B2 · kind B2 · utility
15Cited by
14References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 2, 2003 |
| Grant date | Mar 21, 2006 |
| Priority date | — |
| Expiry date | May 16, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of operating an immersion lithography system, including steps of immersing at least a portion of a wafer to be exposed in an immersion medium, wherein the immersion medium comprises at least one bubble; directing an ultrasonic wave through at least a portion of the immersion medium to disrupt and/or dissipate the at least one bubble; and exposing the wafer with an exposure pattern by passing electromagnetic radiation through the immersion medium subsequent to the directing. Also disclosed is a monitoring and control system for an immersion lithography system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.