Ivan Lalovic
25Patents
10h-index
39Co-inventors
75Inventor score
Filing activity: Jul 27, 2001 → Apr 14, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6671294B2 | Laser spectral engineering for lithographic process | Electricity | 77 | Expired |
| US6853653B2 | Laser spectral engineering for lithographic process | Electricity | 44 | Expired |
| US7087907B1 | Detection of contamination in imaging systems by fluorescence and/or absorption spectroscopy | Physics | 36 | Expired |
| US7885309B2 | Laser system | Electricity | 19 | Active |
| US6829040B1 | Lithography contrast enhancement technique by varying focus with wavelength modulation | Physics | 17 | Expired |
| US6984475B1 | Extreme ultraviolet (EUV) lithography masks | Physics | 17 | Expired |
| US7014966B2 | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems | Physics | 15 | Expired |
| US7081956B1 | Method and device for determining reflection lens pupil transmission distribution and illumination intensity distribution in reflective imaging system | Physics | 14 | Expired |
| US7382815B2 | Laser spectral engineering for lithographic process | Electricity | 13 | Expired |
| US7999915B2 | Laser system | Electricity | 12 | Active |
| US8520186B2 | Active spectral control of optical source | Physics | 10 | Active |
| US8170078B2 | Laser system | Electricity | 9 | Active |
| US7139301B2 | Laser spectral engineering for lithographic process | Electricity | 8 | Expired |
| US9715180B2 | Wafer-based light source parameter control | Physics | 8 | Active |
| US6977717B1 | Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging system | Physics | 4 | Expired |
| US7298770B2 | Laser spectral engineering for lithographic process | Electricity | 3 | Expired |
| US11073423B2 | Hyperspectral sensing system and processing methods for hyperspectral data | Physics | 2 | Active |
| US10794888B2 | Hyperspectral sensing system | Physics | 1 | Active |
| US9709897B2 | Polarization control of pulsed light beam | Physics | 1 | Active |
| US11333649B2 | Hyperspectral sensing system | Physics | 0 | Active |
| US11221322B2 | Hyperspectral sensing system | Physics | 0 | Active |
| US7741012B1 | Method for removal of immersion lithography medium in immersion lithography processes | Physics | 0 | Active |
| US12072242B2 | Hyperspectral sensing system and processing methods for hyperspectral data | Physics | 0 | Active |
| US10036960B2 | Wafer-based light source parameter control | Physics | 0 | Active |
| US11650190B2 | Hyperspectral sensing system and methods | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.