Tuning electrodes used in a reactor for electrochemically processing a microelectronic workpiece
US7020537B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 4, 2001 |
| Grant date | Mar 28, 2006 |
| Priority date | — |
| Expiry date | Sep 20, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A facility for selecting and refining electrical parameters for processing a microelectronic workpiece in a processing chamber is described. The facility initially configures the electrical parameters in accordance with either a numerical of the processing chamber or experimental data derived from operating the actual processing chamber. After a workpiece is processed with the initial parameter configuration, the results are measured and a sensitivity matrix based upon the numerical model of the processing chamber is used to select new parameters that correct for any deficiencies measured in the processing of the first workpiece. These parameters are then used in processing a second workpiece, which may be similarly measured, and the results used to further refine the parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.