Methods and systems for inspecting reticles using aerial imaging at off-stepper wavelengths
US7027143B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 6, 2003 |
| Grant date | Apr 11, 2006 |
| Priority date | — |
| Expiry date | Sep 3, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for inspecting a reticle are provided. A method may include forming an aerial image of the reticle with an inspection system at a wavelength different from a wavelength of an exposure system. The method may also include correcting the aerial image for differences between modulation transfer functions (MTF) of the inspection system and the exposure system. In this manner, the corrected aerial image may be substantially equivalent to an image of the reticle that would be printed onto a specimen by the exposure system at the wavelength of the exposure system. In addition, the method may include detecting defects on the reticle using the corrected aerial image. The detected defects may include approximately all of the defects that would be printed onto a specimen by the exposure system using the reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.