System and method for inspection of a substrate that has a refractive index
US7030978B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2003 |
| Grant date | Apr 18, 2006 |
| Priority date | — |
| Expiry date | Feb 16, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/8806
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system and method for inspection of a substrate having a first refractive index, the method including the steps of: (i) defining an apodization scheme in response to a characteristic of the layer; (ii) applying an apodizer to apodize a beam of radiation in response to the apodization scheme; (iii) directing the apodized beam of radiation to impinge on the substrate, whereby a plurality of rays are reflected from the substrate; whereas the apodized beam of radiation propagates through an at least partially transparent medium having a third refractive index and an at least partially transparent layer having a second refractive index and is subsequently reflected from the substrate; whereas the second refractive index differs from the first refractive index and from the third refractive index; and (iv) detecting at least some of the plurality of reflected rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.