Optical metrology of single features
US7030999B2 · kind B2 · utility
6Cited by
5References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 2004 |
| Grant date | Apr 18, 2006 |
| Priority date | — |
| Expiry date | May 24, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/4788
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The profile of a single feature formed on a wafer can be determined by obtaining an optical signature of the single feature using a beam of light focused on the single feature. The obtained optical signature can then be compared to a set of simulated optical signatures, where each simulated optical signature corresponds to a hypothetical profile of the single feature and is modeled based on the hypothetical profile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.