Imaging integrated circuits with focused ion beam
US7036109B1 · kind B1 · utility
1Cited by
11References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 2002 |
| Grant date | Apr 25, 2006 |
| Priority date | — |
| Expiry date | Nov 25, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/3174
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Methods and apparatus for integrated circuit diagnosis, characterization or modification using a focused ion beam. A method for editing an integrated circuit includes acquiring an image of structures of an integrated circuit by applying a focused ion beam to an outer surface of the integrated circuit to visualize structures beneath the outer surface of the integrated circuit. The method includes using the image to find a location of a circuit element in the integrated circuit and then performing one or more editing operations on the circuit element by applying a focused ion beam to the location found.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.