Lithographic apparatus and device manufacturing method
US7038760B2 · kind B2 · utility
65Cited by
23References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2004 |
| Grant date | May 2, 2006 |
| Priority date | — |
| Expiry date | Jun 23, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7034
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.