Patent · US Expired

System for and method of investigating the exact same point on a sample substrate with at least two wavelengths

US7057717B1 · kind B1 · utility

2Cited by

6References

10Claims

0Family size

Assignee

J.A. WOOLLAM CO., INC. · US

Inventors

Martin M. Liphardt · Lincoln, US
Blaine D. Johs · Lincoln, US
Craig M. Herzinger · Lincoln, US
Ping He · Lincoln, US
Christopher A. Goeden · Lincoln, US
John A. Woollam · Lincoln, US
James D. Welch · Omaha, US

Key dates

Filing date	Apr 30, 2003
Grant date	Jun 6, 2006
Priority date	—
Expiry date	Mar 12, 2024

Classification

Technology area (CPC G)Physics
CPC primaryG01N21/211
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Disclosed are system for and method of analyzing the substantially the exact same point on a sample system with at least two wavelengths, or at least two ranges of wavelengths for which the focal lengths do not vary more than within an acceptable amount.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.