Charged particle beam apparatus
US7081625B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 5, 2003 |
| Grant date | Jul 25, 2006 |
| Priority date | — |
| Expiry date | Nov 5, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2817
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The object of the present invention is to transmit the position information of a defect that has been specified by means of a circuit pattern inspection apparatus quickly and precisely so that the position information is efficiently used in another apparatus. Marking is carried out on the peripheral area of the defect by use of a charged particle beam irradiation mechanism of the inspection apparatus. The marking realizes sharing of the defect position information with another apparatus. The marking technique includes deposition of a deposit and charging up by means of irradiation of a charged particle beam. The marking in the inspection apparatus allows the defect position information to be transmitted to another apparatus more correctly and easily, and as a result, analysis accuracy is improved and analysis time is shortened.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.