Methods of forming patterned reticles
US7086031B2 · kind B2 · utility
3Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 4, 2004 |
| Grant date | Aug 1, 2006 |
| Priority date | — |
| Expiry date | Feb 23, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The invention includes methods of forming patterned reticles. Design features can be introduced into a layout for a reticle prior to optical proximity correction, and then removed prior to taping a pattern onto the reticle. Design features can alternatively, or additionally, be introduced after optical proximity correction and asymmetrically relative to one or more parts of a reticle pattern. The introduced features can subsequently be taped to the reticle as part of the formation of the patterned reticle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.