Patent · US Expired

Method of fabricating an oxide collar for a trench capacitor

US7087485B2 · kind B2 · utility

3Cited by

4References

15Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Harald Seidl · Brandenburg an der Havel, DE
Martin Gutsche · Dorfen, DE
Thomas Hecht · Dresden, DE

Key dates

Filing date	Jan 28, 2004
Grant date	Aug 8, 2006
Priority date	—
Expiry date	Jan 28, 2024

Classification

Technology area (CPC H)Electricity
CPC primaryH10B12/0387
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A method for fabricating patterned ceramic layers on areas of a relief structure, wherein the layers may be arranged essentially perpendicular to a top side of a substrate. In exemplary embodiments, a patterned ceramic layer forms an oxide collar for a trench capacitor. The oxide collar is produced by a trench firstly being filled with a resist in its lower section, and an oxide layer subsequently being produced on the uncovered areas of the substrate with the aid of a low temperature ALD method. By means of anisotropic etching, only those portions of the ceramic layer which are arranged at the perpendicular walls of the trench remain. The resist filling may subsequently be removed, for example, by means of an oxygen plasma.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.