Facet mirror having a number of mirror facets
US7090362B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 7, 2004 |
| Grant date | Aug 15, 2006 |
| Priority date | — |
| Expiry date | May 7, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70275
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a facet mirror with a number of mirror facets, wherein the mirror facets are provided with reflecting surfaces, the mirror facets are mounted jointly in a basic body via bearing devices. The mirror facets comprise mirror bodies contacting at the periphery with the bearing devices via a surface, line or point contact. The preferred field of use of the facet mirrors is a projection objective of a projection exposure machine in microlithography for fabricating semiconductor elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.