Methods for the reduction and elimination of particulate contamination with CVD of amorphous carbon

US7094442B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Martin Jay Seamons · San Jose, US
• Wendy H. Yeh · Mountain View, US
• Sudha Rathi · San Jose, US
• Heraldo Botelho · Palo Alto, US

Key dates

• Filing date: Jul 13, 2004
• Grant date: Aug 22, 2006
• Expiry date: Oct 19, 2024

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02274
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method is provided for forming an amorphous carbon layer, deposited on a dielectric material such as oxide, nitride, silicon carbide, carbon doped oxide, etc., or a metal layer such as tungsten, aluminum or poly-silicon. The method includes the use of chamber seasoning, variable thickness of seasoning film, wider spacing, variable process gas flows, post-deposition purge with inert gas, and post-deposition plasma purge, among others, to make the deposition of an amorphous carbon film at low deposition temperatures possible without any defects or particle contamination.