Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
US7116394B2 · kind B2 · utility
19Cited by
11References
31Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Dec 19, 2003 |
| Grant date | Oct 3, 2006 |
| Priority date | — |
| Expiry date | Apr 2, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70925
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.