Capacitive monitors for detecting metal extrusion during electromigration
US7119545B2 · kind B2 · utility
5Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2004 |
| Grant date | Oct 10, 2006 |
| Priority date | — |
| Expiry date | Jan 5, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for detecting metal extrusion associated with electromigration (EM) under high current density situations within an EM test line by measuring changes in capacitance associated with metal extrusion that occurs in the vicinity of the charge carrying surfaces of one or more capacitors situated in locations of close physical proximity to anticipated sites of metal extrusion on an EM test line are provided. The capacitance of each of the one or more capacitors is measured prior to and then during or after operation of the EM test line so as to detect capacitance changes indicating metal extrusion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.