Ronald G. Filippi
114Patents
16h-index
104Co-inventors
89Inventor score
Filing activity: Apr 30, 1997 → Jan 4, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7397260B2 | Structure and method for monitoring stress-induced degradation of conductive interconnects | Electricity | 167 | Expired |
| US6383920B1 | Process of enclosing via for improved reliability in dual damascene interconnects | Electricity | 102 | Expired |
| US6417572B1 | Process for producing metal interconnections and product produced thereby | Electricity | 53 | Expired |
| US6202191A | Electromigration resistant power distribution network | Electricity | 48 | Expired |
| US8304863B2 | Electromigration immune through-substrate vias | Electricity | 29 | Active |
| US6603321B2 | Method and apparatus for accelerated determination of electromigration characteristics of semiconductor wiring | Electricity | 24 | Expired |
| US9502350B1 | Interconnect scaling method including forming dielectric layer over subtractively etched first conductive layer and forming second conductive material on dielectric layer | Electricity | 22 | Active |
| US9601426B1 | Interconnect structure having subtractive etch feature and damascene feature | Electricity | 21 | Active |
| US7560375B2 | Gas dielectric structure forming methods | Electricity | 21 | Expired |
| US10177031B2 | Subtractive etch interconnects | Electricity | 19 | Active |
| US8056039B2 | Interconnect structure for integrated circuits having improved electromigration characteristics | Electricity | 18 | Active |
| US8299567B2 | Structure of metal e-fuse | Electricity | 17 | Active |
| US8232646B2 | Interconnect structure for integrated circuits having enhanced electromigration resistance | Electricity | 17 | Active |
| US9171801B2 | E-fuse with hybrid metallization | Electricity | 17 | Active |
| US5943601A | Process for fabricating a metallization structure | Electricity | 16 | Expired |
| US6518670B1 | Electrically porous on-chip decoupling/shielding layer | Electricity | 16 | Expired |
| US6037795A | Multiple device test layout | Electricity | 14 | Expired |
| US9536830B2 | High performance refractory metal / copper interconnects to eliminate electromigration | Electricity | 13 | Active |
| US8633707B2 | Stacked via structure for metal fuse applications | Electricity | 12 | Active |
| US9685404B2 | Back-end electrically programmable fuse | Electricity | 11 | Active |
| US9059170B2 | Electronic fuse having a damaged region | Electricity | 11 | Active |
| US7737528B2 | Structure and method of forming electrically blown metal fuses for integrated circuits | Electricity | 10 | Active |
| US6448173B1 | Aluminum-based metallization exhibiting reduced electromigration and method therefor | Electricity | 9 | Expired |
| US8420537B2 | Stress locking layer for reliable metallization | Electricity | 9 | Active |
| US7260810B2 | Method of extracting properties of back end of line (BEOL) chip architecture | Physics | 8 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.