Plasma display panel with a low K dielectric layer

US7122962B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Kam S. Law · San Jose, US
• Quanyuan Shang · Saratoga, US
• Takako Takehara · Hayward, US
• Taekyung Won · San Jose, US
• William Harshbarger · San Jose, US
• Dan Maydan · Los Altos Hills, US

Key dates

• Filing date: Jun 11, 2003
• Grant date: Oct 17, 2006
• Expiry date: Jun 29, 2024

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J11/12
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

A plasma display panel including a low k dielectric layer. In one embodiment, the dielectric layer is comprises a fluorine-doped silicon oxide layer such as an SiOF layer. In another embodiment, the dielectric layer comprises a Black Diamond™ layer. In certain embodiments, a capping layer such as SiN or SiON is deposited over the dielectric layer.