Patent · US Expired

Method and system for handling substrates in a production line including a cluster tool and a metrology tool

US7130762B2 · kind B2 · utility

10Cited by
4References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 7, 2003
Grant dateOct 31, 2006
Priority date
Expiry dateNov 25, 2024

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P90/02
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

In a production line, a cluster tool having a plurality of substantially identical process modules and a metrology tool includes a control unit that allows one to receive, store and process information that indicates in which process module which substrates have been processed and which selects, on the basis of the process information, which substrate has to be subjected to a measurement. Advantageously, the substrates are selected so that each process module is represented by a corresponding substrate to be measured in order to reliably monitor the process quality of each process module.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.