Kay Hellig
13Patents
8h-index
14Co-inventors
58Inventor score
Filing activity: Dec 12, 2001 → Oct 27, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6893967B1 | L-shaped spacer incorporating or patterned using amorphous carbon or CVD organic materials | Electricity | 230 | Expired |
| US6673635B1 | Method for alignment mark formation for a shallow trench isolation process | Electricity | 30 | Expired |
| US6696334B1 | Method for formation of a differential offset spacer | Electricity | 24 | Expired |
| US7256113B1 | System for forming a semiconductor device and method thereof | Electricity | 12 | Expired |
| US6881616B1 | System for forming a semiconductor device and method thereof including implanting through a L shaped spacer to form source and drain regions | Electricity | 12 | Expired |
| US6979651B1 | Method for forming alignment features and back-side contacts with fewer lithography and etch steps | Electricity | 11 | Expired |
| US7130762B2 | Method and system for handling substrates in a production line including a cluster tool and a metrology tool | Emerging Cross-Sectional Technologies | 10 | Expired |
| US7151055B2 | Technique for forming a gate electrode by using a hard mask | Electricity | 8 | Expired |
| US6828240B2 | Method of manufacturing multi-level contacts by sizing of contact sizes in integrated circuits | Electricity | 7 | Expired |
| US6699641B1 | Photosensitive bottom anti-reflective coating | Electricity | 6 | Expired |
| US6902870B1 | Patterning of dielectric with added layers of materials aside from photoresist for enhanced pattern transfer | Electricity | 4 | Expired |
| US6703297B1 | Method of removing inorganic gate antireflective coating after spacer formation | Electricity | 3 | Expired |
| US7962459B2 | Method of providing context specific recipes in a semiconductor facility by defining product categories | Emerging Cross-Sectional Technologies | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.