Method and apparatus for performing limited area spectral analysis
US7158221B2 · kind B2 · utility
11Cited by
9References
24Claims
0Family size
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Key dates
| Filing date | Dec 23, 2003 |
| Grant date | Jan 2, 2007 |
| Priority date | — |
| Expiry date | Dec 27, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/26
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for obtaining in-situ data of a substrate in a semiconductor substrate processing chamber is provided. The apparatus includes an optics assembly for acquiring data regarding a substrate and an actuator assembly adapted to laterally move the optics assembly in two dimensions relative to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.