Real time immersion medium control using scatterometry
US7158896B1 · kind B1 · utility
20Cited by
5References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 1, 2004 |
| Grant date | Jan 2, 2007 |
| Priority date | — |
| Expiry date | Mar 19, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Systems and/or methods are disclosed for measuring and/or controlling an amount of impurity that is dissolved within an immersion medium employed with immersion lithography. The impurity can be photoresist from a photoresist layer coated upon a substrate surface. A known grating structure is built upon the substrate. A real time immersion medium monitoring component facilitates measuring and/or controlling the amount of impurities dissolved within the immersion medium by utilizing light scattered from the known grating structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.