Apparatus for cyclical deposition of thin films
US7175713B2 · kind B2 · utility
59Cited by
99References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 27, 2003 |
| Grant date | Feb 13, 2007 |
| Priority date | — |
| Expiry date | Oct 16, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6719
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.