Organic anti-reflective coating polymer, its preparation method and organic anti-reflective coating composition comprising the same
US7198887B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 29, 2004 |
| Grant date | Apr 3, 2007 |
| Priority date | — |
| Expiry date | May 4, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed are an organic anti-reflective coating polymer having a structure represented by the following formula I, its preparation method and an organic anti-reflective coating composition with respect to an ultra-fine pattern formation process of the photoresist for photolithography technique using ArF light source with a wavelength of 193 nm or VUV light source with a wavelength of 157 nm. An organic anti-reflective coating polymer capable of protecting a photoresist from amines in the atmosphere to minimize the post exposure delay effect after exposure to light and, at the same time, enhances notching status, such as, a pattern distortion caused by diffused reflection, and reducing reflection rate to minimize the swing effect.wherein m is an integer ranging from 5 to 5000.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.