Lithographic apparatus and device manufacturing method
US7199858B2 · kind B2 · utility
298Cited by
24References
29Claims
0Family size
Assignee
Inventors
- Joeri Lof
- Erik Theodorus Maria Bijlaart
- Hans Butler
- Sjoerd Nicolaas Lambertus Donders
- Christiaan Alexander Hoogendam
- Aleksey Yurievich Kolesnychenko
- Erik Roelof Loopstra
- Hendricus Johannes Maria Meijer
- Jeroen Johannes Sophia Maria Mertens
- Johannes Catharinus Hubertus Mulkens
- Roelof Aeilko Siebrand Ritsema
- Frank Van Schaik
- Timotheus Franciscus Sengers
- Klaus Simon
- Joannes Theodoor De Smit
- Alexander Straaijer
- Bob Streefkerk
- Helmar Van Santen
Key dates
| Filing date | Nov 12, 2003 |
| Grant date | Apr 3, 2007 |
| Priority date | — |
| Expiry date | Nov 12, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70866
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.